The Resource Nanofabrication using focused ion and electron beams : principles and applications, edited by Ivo Utke, Stanislav Moshkalev, Phillip Russell, (electronic resource)

Nanofabrication using focused ion and electron beams : principles and applications, edited by Ivo Utke, Stanislav Moshkalev, Phillip Russell, (electronic resource)

Label
Nanofabrication using focused ion and electron beams : principles and applications
Title
Nanofabrication using focused ion and electron beams
Title remainder
principles and applications
Statement of responsibility
edited by Ivo Utke, Stanislav Moshkalev, Phillip Russell
Contributor
Subject
Genre
Language
  • eng
  • eng
Summary
Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabr
Member of
Cataloging source
MiAaPQ
Dewey number
  • 620.1/15
  • 620.115
Index
no index present
Language note
English
LC call number
TA418.9.N35
LC item number
N2525 2011
Literary form
non fiction
Nature of contents
dictionaries
http://library.link/vocab/relatedWorkOrContributorDate
1955-
http://library.link/vocab/relatedWorkOrContributorName
  • Utke, Ivo
  • Moshkalev, Stanislav
  • Russell, Phillip
Series statement
Nanomanufacturing series
Series volume
v. 1
http://library.link/vocab/subjectName
  • Nanostructured materials
  • Nanotechnology
  • Electron beams
  • Ion bombardment
Label
Nanofabrication using focused ion and electron beams : principles and applications, edited by Ivo Utke, Stanislav Moshkalev, Phillip Russell, (electronic resource)
Instantiates
Publication
Note
Description based upon print version of record
Carrier category
online resource
Carrier category code
cr
Content category
text
Content type code
txt
Contents
  • Cover; Contents; Foreword; Preface; Contributors; INTRODUCTION; I-1.The Historical Development of Electron Beam Induced Deposition and Etching: From Carbonaceous to Functional Materials; I-2. Historical Evolution of FIB Instrumentation and Technology: From Circuit Editing to Nanoprototyping; PART I: FUNDAMENTALS AND MODELS; 1.The Theory of Bright Field Electron and Field Ion Emission Sources; 2. How to Select Compounds for Focused Charged Particle Beam Assisted Etching and Deposition; 3. Gas Injection Systems for FEB and FIB Processing Theory and Experiment
  • 4. Fundamentals of Interactions of Electrons with Molecules5. Simulation of Focused Ion Beam Milling; 6. FEB and FIB Continuum Models for One Adsorbate Species; 7. Continuum Modeling of Electron Beam Induced Processes; 8. Monte Carlo Method in FEBID Process Simulations; PART II: APPLICATIONS; 9. Focused Electron Beam Induced Processing (FEBIP) for Industrial Applications; 10. Focused Ion Beam and DualBeamTMTechnology Applied to Nanoprototyping; 11. Review of FIB Tomography; 12. In situ Monitoring of Gas-Assisted Focused Ion Beam and Focused Electron Beam Induced Processing
  • 13. Cluster Beam Deposition of Metal, Insulator, and Semiconductor Nanoparticles14. Electron- and Ion-Assisted Metal Deposition for the Fabrication of Nanodevices Based on Individual Nanowires; 15. Focused Ion Beam Fabrication of Carbon Nanotube and ZnO Nanodevices; 16. Focused Ion and Electron Beam Induced Deposition of Magnetic Nanostructures; 17. Metal Films and Nanowires Deposited by FIB and FEB for Nanofabrication and Nanocontacting; 18. FIB Etching for Photonic Device Applications; 19. FIB etching of InP for Rapid Prototyping of Photonic Crystals
  • 20. Applications of FIB for Rapid Prototyping of Photonic Devices, Fabrication of Nanosieves, Nanowires, and Nanoantennas21. Focused Particle Beam Induced Deposition of Silicon Dioxide; 22. Growth and Characterization of FEB-Deposited Suspended Nanostructures; 23. Electrical Transport Properties of Metallic Nanowires and Nanoconstrictions Created with FIB; 24. Structure-Property Relationship of Electronic Transport in FEBID Structures; 25. Characterization and Modification of Nanostructured Carbon Materials Using FIB and FEB
  • 26. Electron Beam Controlled Patterning of Molecular Layers: Functional Surfaces and Nanomembranes27. Nanofabrication Using Electron Beam Lithography Processes; PART III: PROSPECTIVES; F-1. Focused Beam Processing-New BeamTechnologies-New Challenges in Process Development and Nanofabrication; Index; A; B; C; D; E; F; G; H; I; J; K; L; M; N; O; P; Q; R; S; T; U; V; W; X; Y; Z
Dimensions
unknown
Extent
1 online resource (830 p.)
Form of item
online
Isbn
9786613623331
Media category
computer
Media type code
c
Specific material designation
remote
System control number
  • (CKB)2550000000089311
  • (EBL)886626
  • (OCoLC)777268040
  • (SSID)ssj0000638917
  • (PQKBManifestationID)11408673
  • (PQKBTitleCode)TC0000638917
  • (PQKBWorkID)10598661
  • (PQKB)11077483
  • (MiAaPQ)EBC886626
  • (EXLCZ)992550000000089311
Label
Nanofabrication using focused ion and electron beams : principles and applications, edited by Ivo Utke, Stanislav Moshkalev, Phillip Russell, (electronic resource)
Publication
Note
Description based upon print version of record
Carrier category
online resource
Carrier category code
cr
Content category
text
Content type code
txt
Contents
  • Cover; Contents; Foreword; Preface; Contributors; INTRODUCTION; I-1.The Historical Development of Electron Beam Induced Deposition and Etching: From Carbonaceous to Functional Materials; I-2. Historical Evolution of FIB Instrumentation and Technology: From Circuit Editing to Nanoprototyping; PART I: FUNDAMENTALS AND MODELS; 1.The Theory of Bright Field Electron and Field Ion Emission Sources; 2. How to Select Compounds for Focused Charged Particle Beam Assisted Etching and Deposition; 3. Gas Injection Systems for FEB and FIB Processing Theory and Experiment
  • 4. Fundamentals of Interactions of Electrons with Molecules5. Simulation of Focused Ion Beam Milling; 6. FEB and FIB Continuum Models for One Adsorbate Species; 7. Continuum Modeling of Electron Beam Induced Processes; 8. Monte Carlo Method in FEBID Process Simulations; PART II: APPLICATIONS; 9. Focused Electron Beam Induced Processing (FEBIP) for Industrial Applications; 10. Focused Ion Beam and DualBeamTMTechnology Applied to Nanoprototyping; 11. Review of FIB Tomography; 12. In situ Monitoring of Gas-Assisted Focused Ion Beam and Focused Electron Beam Induced Processing
  • 13. Cluster Beam Deposition of Metal, Insulator, and Semiconductor Nanoparticles14. Electron- and Ion-Assisted Metal Deposition for the Fabrication of Nanodevices Based on Individual Nanowires; 15. Focused Ion Beam Fabrication of Carbon Nanotube and ZnO Nanodevices; 16. Focused Ion and Electron Beam Induced Deposition of Magnetic Nanostructures; 17. Metal Films and Nanowires Deposited by FIB and FEB for Nanofabrication and Nanocontacting; 18. FIB Etching for Photonic Device Applications; 19. FIB etching of InP for Rapid Prototyping of Photonic Crystals
  • 20. Applications of FIB for Rapid Prototyping of Photonic Devices, Fabrication of Nanosieves, Nanowires, and Nanoantennas21. Focused Particle Beam Induced Deposition of Silicon Dioxide; 22. Growth and Characterization of FEB-Deposited Suspended Nanostructures; 23. Electrical Transport Properties of Metallic Nanowires and Nanoconstrictions Created with FIB; 24. Structure-Property Relationship of Electronic Transport in FEBID Structures; 25. Characterization and Modification of Nanostructured Carbon Materials Using FIB and FEB
  • 26. Electron Beam Controlled Patterning of Molecular Layers: Functional Surfaces and Nanomembranes27. Nanofabrication Using Electron Beam Lithography Processes; PART III: PROSPECTIVES; F-1. Focused Beam Processing-New BeamTechnologies-New Challenges in Process Development and Nanofabrication; Index; A; B; C; D; E; F; G; H; I; J; K; L; M; N; O; P; Q; R; S; T; U; V; W; X; Y; Z
Dimensions
unknown
Extent
1 online resource (830 p.)
Form of item
online
Isbn
9786613623331
Media category
computer
Media type code
c
Specific material designation
remote
System control number
  • (CKB)2550000000089311
  • (EBL)886626
  • (OCoLC)777268040
  • (SSID)ssj0000638917
  • (PQKBManifestationID)11408673
  • (PQKBTitleCode)TC0000638917
  • (PQKBWorkID)10598661
  • (PQKB)11077483
  • (MiAaPQ)EBC886626
  • (EXLCZ)992550000000089311

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